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Anglický jazyk
CMOS Plasma and Process Damage
Autor: Kirk Prall
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are... Viac o knihe
Na objednávku
135.84 €
bežná cena: 142.99 €
O knihe
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
- Provides an up-to-date, single-source reference on CMOS plasma and process damage, for engineers from all disciplines
- Offers concise, comprehensive coverage, discussing real problems with necessary background for working engineers
- Applies to design, layout, mask making, lithography, process and device engineering, testing and reliability
- Vydavateľstvo: Springer
- Rok vydania: 2025
- Formát: Hardback
- Rozmer: 241 x 160 mm
- Jazyk: Anglický jazyk
- ISBN: 9783031890284
Nemecký jazyk 
