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Anglický jazyk
Ion Implantation and Annealing Applications, Science and Technology
Autor: Wilfried Lerch
This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS... Viac o knihe
Predpokladaný dátum vydania: 1.6.2026
227.69 €
bežná cena: 252.99 €
O knihe
This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.
- Vydavateľstvo: Springer-Verlag GmbH
- Rok vydania: 2026
- Formát: Hardback
- Rozmer: 235 x 155 mm
- Jazyk: Anglický jazyk
- ISBN: 9783032100078
Nemecký jazyk 
