-
Anglický jazyk
Handbook of Photomask Manufacturing Technology
Autor: Syed Rizvi
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to... Viac o knihe
Na objednávku, dodanie 2-4 týždne
368.98 €
bežná cena: 388.40 €
O knihe
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography.
- Vydavateľstvo: CRC Press
- Rok vydania: 2005
- Formát: Hardback
- Rozmer: 260 x 183 mm
- Jazyk: Anglický jazyk
- ISBN: 9780824753740
Nemecký jazyk 
